Grain-boundary nanosegregation of alpha–FeOOH and alpha-Fe2O3 in TiO2 films cause deleterious effect on photocatalytic and photoelectrocatalytic activity. Electron scattering at grain boundaries contributes to increasing the resistivity of the semiconductor film, affecting strongly electron diffusion inside the film.
Año: 2018
ISSN: 1932-7455
Revista: The Journal of Physical Chemstry C
Editorial: American Chemical Society